Skin Layer Defects in Si by Optimized Treatment in Hydrogen RF Plasma

Publication type: 
Journal
Authors: 
Ghica, C; Nistor, LC; Vizireanu, S; Dinescu, G; Moldovan, A; Dinescu, M
Year: 
2010
DOI: 
http://dx.doi.org/10.1002/ppap.201000066

Journal data

Journal: 
PLASMA PROCESSES AND POLYMERS
Vol.: 
7
Pag.: 
986 991