Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

Publication type:

Journal

Authors:

Cristea, D; Crisan, A; Cretu, N; Borges, J; Lopes, C; Cunha, L; Ion, V; Dinescu, M; Barradas, NP; Alves, E; Apreutesei, M; Munteanu, D

Year:

2015

DOI:

http://dx.doi.org/10.1016/j.apsusc.2015.06.167

Journal data

Journal:

APPLIED SURFACE SCIENCE

Vol.:

354

Pag.:

298 305