RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

Publication type:

Journal

Authors:

Simionescu, OG; Romanitan, C; Tutunaru, O; Ion, V; Buiu, O; Avram, A

Year:

2019

DOI:

http://dx.doi.org/10.3390/coatings9070442

Journal data

Journal:

COATINGS

Vol.:

Pag.:

442