The deep level influence on the admittance of AlN/Si structures with pulsed laser deposited AlN films

Publication type:

Journal

Authors:

S. Simeonov, A. Szekeres, I. Minkov, S. Grigorescu, G. Socol, C. Ristoscu, I. N. Mihailescu

Number of authors:

Year:

2009

Journal data

Journal:

Journal of Optoelectronics and Advanced Materials

Vol.:

11(9)

Pag.:

1292-1295

ISI factor:

0.577