Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets

Publication type: 
Journal
Authors: 
Kuchakova, I; Ionita, MD; Ionita, ER; Lazea-Stoyanova, A; Brajnicov, S; Mitu, B; Dinescu, G; De Vrieze, M; Cvelbar, U; Zille, A; Leys, C; Yu Nikiforov, A
Year: 
2020
DOI: 
http://dx.doi.org/10.3390/ma13061296

Journal data

Journal: 
MATERIALS
Vol.: 
13
Issue: 
6
Pag.: 
1296