Quantitative fs-TALIF in high-pressure NRP discharges: calibration using VUV absorption spectroscopy

Publication type: 
Journal
Autori: 
Dumitrache, C; Gallant, A; de Oliveira, N; Laux, CO; Stancu, GD
Anul: 
2021
DOI: 
http://dx.doi.org/10.1088/1361-6595/ac3e41

Journal data

Journal: 
PLASMA SOURCES SCIENCE & TECHNOLOGY
Vol.: 
31
Issue: 
1
Pag.: 
15004