Efficient relaxation of strained-SiGe layers induced by thermal oxidation

Publication type:

Journal

Autori:

Jang, JH; Son, SY; Lim, W; Phen, MS; Siebein, K; Craciun, V

Anul:

2010

DOI:

http://dx.doi.org/10.1016/j.tsf.2009.09.146

Journal data

Journal:

THIN SOLID FILMS

Vol.:

518

Pag.:

2462 2465