Investigation of Ta2O5 and TaSixOy thin films obtained by radio frequency plasma assisted laser ablation for gate dielectric applications

Publication type: 
Journal
Autori: 
Filipescu, M; Ion, V; Somacescu, S; Mitu, B; Dinescu, M
Anul: 
2013
DOI: 
http://dx.doi.org/10.1016/j.apsusc.2013.03.154

Journal data

Journal: 
APPLIED SURFACE SCIENCE
Vol.: 
276
Pag.: 
691 696