The effect of the substrate temperature and the acceleration potential drop on the structural and physical properties of SiC thin films deposed by TVA method

Ciupina, V; Lungu, CP; Vladoiu, R; Prodan, GC; Antohe, S; Porosnicu, C; Stanescu, I; Jepu, I; Iftimie, S; Prodan, M; Mandes, A; Dinca, V; Vasile, E; Zarovski, V; Nicolescu, V