Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

Publication type: 
Journal
Autori: 
Cristea, D; Crisan, A; Cretu, N; Borges, J; Lopes, C; Cunha, L; Ion, V; Dinescu, M; Barradas, NP; Alves, E; Apreutesei, M; Munteanu, D
Anul: 
2015
DOI: 
http://dx.doi.org/10.1016/j.apsusc.2015.06.167

Journal data

Journal: 
APPLIED SURFACE SCIENCE
Vol.: 
354
Pag.: 
298 305