Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

Cristea, D; Crisan, A; Cretu, N; Borges, J; Lopes, C; Cunha, L; Ion, V; Dinescu, M; Barradas, NP; Alves, E; Apreutesei, M; Munteanu, D