Joining Chemical Pressure and Epitaxial Strain to Yield Y-doped BiFeO3 Thin Films with High Dielectric Response

Publication type:

Journal

Autori:

Scarisoreanu, ND; Craciun, F; Birjega, R; Ion, V; Teodorescu, VS; Ghica, C; Negrea, R; Dinescu, M

Anul:

2016

DOI:

http://dx.doi.org/10.1038/srep25535

Journal data

Journal:

SCIENTIFIC REPORTS

Vol.:

Pag.:

25535