Atmospheric pressure etching of silicon surface with fluorine-containing cold plasma jets

Publication type:

Conference / Workshop

Autori:

M.D. Ionita; E.R. Ionita; G. Dinescu

Anul:

2017

Conference / Workshop data

Conference / Workshop:

17th International Conference on Plasma Physics and Application (CPPA 2017)

Location:

Magurele-Bucharest, Romania

Period:

15-20 June 2017

Presentation method:

Poster