Atmospheric pressure etching of silicon surface with fluorine-containing cold plasma jets

Publication type: 
Conference / Workshop
Autori: 
M.D. Ionita; E.R. Ionita; G. Dinescu
Anul: 
2017

Conference / Workshop data

Conference / Workshop: 
17th International Conference on Plasma Physics and Application (CPPA 2017)
Location: 
Magurele-Bucharest, Romania
Period: 
15-20 June 2017
Presentation method: 
Poster