Synchronous plasma enhancement in RF-driven plasma source for ion implantation

Publication type: 
Journal
Autori: 
C. Diplasu, A. Surmeian, A. Groza and M. Ganciu
Number of authors: 
4
Anul: 
2009

Journal data

Journal: 
Surface & Coatings Technology
Vol.: 
203
Pag.: 
2858-2862
ISI factor: 
1.868